Our group is active in the area of materials science with a focus on solid state kinetics. Kinetic processes in solids and at interfaces (metals, ceramics, semiconductors) play a key role for synthesis and optimization of structural and functional materials as well as for the functionality of devices. In this context, atomic/ionic transport mechanisms (diffusion), defect equilibria and interface reactions are of high importance for an understanding of fundamental and application relevant properties.

We focus on time-resolved thin film and interface analysis on the nano/micometer scale including in-situ characterization of materials and processes. We primarily use neutron and X-ray scattering (NR, GI-XRD, XRR) at large scale facilities in combination with ion beam (SIMS), electrochemical (EIS, CV, GITT), spectroscopic (IR) and electron optical (SEM) techniques. Further, we are engaged in thin film preperation with sputtering methods.